Nanoscale Molecular Homogeneity in EUV Photoresists
As EUV lithography pushes toward smaller feature sizes, resist performance increasingly depends on molecular-level uniformity. Conventional metrology cannot identify the nanoscale chemical heterogeneities that drive resist stochastics.
Key advantages of NP-SIMS
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Monitor molecular composition throughout exposure, PEB and development.
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Track PAGs, quenchers and reaction by-products simultaneously
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Identify incomplete deprotection and insoluble nanoscale domains.
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Characterize molecular homogeneity at dimensions relevant to advanced EUV lithography
Supporting publication
Journal of Micro/Nanopatterning, Materials, and Metrology, (2022)
Nanoscale Molecular Homogeneity in EUV Photoresists
As EUV lithography pushes toward smaller feature sizes, resist performance increasingly depends on molecular-level uniformity. Conventional metrology cannot identify the nanoscale chemical heterogeneities that drive resist stochastics.
Key advantages of NP-SIMS
-
Monitor molecular composition throughout exposure, PEB and development.
-
Track PAGs, quenchers and reaction by-products simultaneously
-
Identify incomplete deprotection and insoluble nanoscale domains.
-
Characterize molecular homogeneity at dimensions relevant to advanced EUV lithography
Supporting publication
Journal of Micro/Nanopatterning, Materials, and Metrology, (2022)
Nanoscale Molecular Characterization of Rare Defects
The homogeneity decline observed across the resist film isn't spread evenly but can be driven by a small number of rare, high-PAG-aggregation sites, invisible to bulk analytical methods
Key advantages of NP-SIMS
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Detect rare nanoscale chemical defects hidden within statistically quasi homogeneous films
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Characterize individual nanoscale domain instead of ensemble averages
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Identify molecular aggregations of photoacid generators (PAGs) associated with resist stochasticity
-
Pinpoint the nanoscale root cause of resist inhomogeneity through rare events analysis
Supporting publication
Journal of Micro/Nanopatterning, Materials, and Metrology, (2022)
Nanoscale Molecular Characterization of Rare Defects
The homogeneity decline observed across the resist film isn't spread evenly but can be driven by a small number of rare, high-PAG-aggregation sites, invisible to bulk analytical methods
Key advantages of NP-SIMS
-
Detect rare nanoscale chemical defects hidden within statistically quasi homogeneous films
-
Characterize individual nanoscale domain instead of ensemble averages
-
Identify molecular aggregations of photoacid generators (PAGs) associated with resist stochasticity
-
Pinpoint the nanoscale root cause of resist inhomogeneity through rare events analysis
Supporting publication
Journal of Micro/Nanopatterning, Materials, and Metrology, (2022)
Molecular Architecture of Bottlebrush Macromolecular Films
The performance of advanced lithographic materials depends on precise nanoscale molecular organization. Conventional analytical techniques cannot directly characterize molecular architecture or distinguish local structural organization within polymer films
Key advantages of NP-SIMS
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Characterize molecular architecture at the nanoscale.
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Identify co-localized molecular species within individual nanodomains
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Differentiate ordered and disordered polymer organizations
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Assess nanoscale structural homogeneity in advanced polymer materials
Supporting publication
Surface and Interface Analysis (2015)
Molecular Architecture of Bottlebrush Macromolecular Films
The performance of advanced lithographic materials depends on precise nanoscale molecular organization. Conventional analytical techniques cannot directly characterize molecular architecture or distinguish local structural organization within polymer films
Key advantages of NP-SIMS
-
Characterize molecular architecture at the nanoscale.
-
Identify co-localized molecular species within
individual nanodomains
-
Differentiate ordered and disordered polymer organizations
-
Assess nanoscale structural homogeneity in advanced polymer materials
Supporting publication
Surface and Interface Analysis (2015)
Region-Specific Molecular Characterization of Nano assemblies
The functionality of complex nano assemblies is governed by distinct chemical environments at particle surfaces and interfaces. Conventional analytical techniques average these regions together, preventing region-specific molecular characterization.
Key advantages of NP-SIMS
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Differentiate molecular information from nanoparticle cores, coatings, interfaces, and surrounding media
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Characterize interface-specific chemistry within complex nanoassemblies
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Resolve distinct nanoscale chemical environments without ensemble averaging
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•Reveal molecular interactions occurring at particle-particle and particle-substrate interfaces
Supporting publication
Analytical Chemistry, (2023)
Region-Specific Molecular Characterization of Nano assemblies
The functionality of complex nano assemblies is governed by distinct chemical environments at particle surfaces and interfaces. Conventional analytical techniques average these regions together, preventing region-specific molecular characterization.
Key advantages of NP-SIMS
-
Differentiate molecular information from nanoparticle cores, coatings, interfaces, and surrounding media
-
Characterize interface-specific chemistry within
complex nanoassemblies
-
Resolve distinct nanoscale chemical environments without ensemble averaging
-
•Reveal molecular interactions occurring at particle-particle and particle-substrate interfaces
Supporting publication
Analytical Chemistry, (2023)




