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Nanoscale Molecular Homogeneity in EUV Photoresists

As EUV lithography pushes toward smaller feature sizes, resist performance increasingly depends on molecular-level uniformity. Conventional metrology cannot identify the nanoscale chemical heterogeneities that drive resist stochastics.

Key advantages of NP-SIMS
  • Monitor molecular composition throughout exposure, PEB and development.
     

  • Track PAGs, quenchers and reaction by-products simultaneously
     

  • Identify incomplete deprotection and insoluble nanoscale domains.

  • Characterize molecular homogeneity at dimensions relevant to advanced EUV lithography

Supporting publication

Journal of Micro/Nanopatterning, Materials, and Metrology, (2022)

Nanoscale Molecular Homogeneity in EUV Photoresists

As EUV lithography pushes toward smaller feature sizes, resist performance increasingly depends on molecular-level uniformity. Conventional metrology cannot identify the nanoscale chemical heterogeneities that drive resist stochastics.

Key advantages of NP-SIMS
  • Monitor molecular composition throughout exposure, PEB and development.
     

  • Track PAGs, quenchers and reaction by-products simultaneously
     

  • Identify incomplete deprotection and insoluble nanoscale domains.

  • Characterize molecular homogeneity at dimensions relevant to advanced EUV lithography

Supporting publication

Journal of Micro/Nanopatterning, Materials, and Metrology, (2022)

Nanoscale Molecular Characterization of Rare Defects

The homogeneity decline observed across the resist film isn't spread evenly but can be driven by a small number of rare, high-PAG-aggregation sites, invisible to bulk analytical methods

Key advantages of NP-SIMS
  • Detect rare nanoscale chemical defects hidden within statistically quasi homogeneous films 
     

  • Characterize individual nanoscale domain instead of ensemble averages
     

  • Identify molecular aggregations of photoacid generators (PAGs) associated with resist stochasticity

  • Pinpoint the nanoscale root cause of resist inhomogeneity through rare events analysis

Supporting publication

Journal of Micro/Nanopatterning, Materials, and Metrology, (2022)

rare defect.png

Top: measured probability distribution of detecting (N) PAG 
Bottom:high PAG aggregation sites correlated with EUV  dose

Nanoscale Molecular Characterization of Rare Defects

The homogeneity decline observed across the resist film isn't spread evenly but can be driven by a small number of rare, high-PAG-aggregation sites, invisible to bulk analytical methods

Key advantages of NP-SIMS
  • Detect rare nanoscale chemical defects hidden within statistically quasi homogeneous films 
     

  • Characterize individual nanoscale domain instead of ensemble averages
     

  • Identify molecular aggregations of photoacid generators (PAGs) associated with resist stochasticity

  • Pinpoint the nanoscale root cause of resist inhomogeneity through rare events analysis

Supporting publication

Journal of Micro/Nanopatterning, Materials, and Metrology, (2022)

rare defect.png

Top: measured probability distribution of detecting (N) PAG 
Bottom:high PAG aggregation sites correlated with EUV  dose

Molecular Architecture of Bottlebrush Macromolecular Films

The performance of advanced lithographic materials depends on precise nanoscale molecular organization. Conventional analytical techniques cannot directly characterize molecular architecture or distinguish local structural organization within polymer films

Key advantages of NP-SIMS
  • Characterize molecular architecture at the nanoscale.

  • Identify co-localized molecular species within individual nanodomains

  • Differentiate ordered and disordered polymer organizations 

  • Assess nanoscale structural homogeneity in advanced polymer materials 

Supporting publication

Surface and Interface Analysis (2015)

DBT-appli.png

Top: Schematic of Au400⁴⁺ impacts on vertically aligned versus disordered bottlebrush polymer domains.
Bottom: Mass spectra  of DBT versus HBT films, showing distinct secondary ion fragments characteristic of each polymer architecture.

Molecular Architecture of Bottlebrush Macromolecular Films

The performance of advanced lithographic materials depends on precise nanoscale molecular organization. Conventional analytical techniques cannot directly characterize molecular architecture or distinguish local structural organization within polymer films

Key advantages of NP-SIMS
  • Characterize molecular architecture at the nanoscale.

  • Identify co-localized molecular species within

        individual nanodomains

  • Differentiate ordered and disordered polymer organizations 

  • Assess nanoscale structural homogeneity in advanced polymer materials 

Supporting publication

Surface and Interface Analysis (2015)

DBT-appli.png

Top: Schematic of Au400⁴⁺ impacts on vertically aligned versus disordered bottlebrush polymer domains.
Bottom: Mass spectra  of DBT versus HBT films, showing distinct secondary ion fragments characteristic of each polymer architecture.

Region-Specific Molecular Characterization of Nano assemblies

The functionality of complex nano assemblies is governed by distinct chemical environments at particle surfaces and interfaces. Conventional analytical techniques average these regions together, preventing region-specific molecular characterization.

Key advantages of NP-SIMS
  • Differentiate molecular information from nanoparticle cores, coatings, interfaces, and surrounding media

  • Characterize interface-specific chemistry within complex nanoassemblies

  • Resolve distinct nanoscale chemical environments without ensemble averaging

  • •Reveal molecular interactions occurring at particle-particle and particle-substrate interfaces

Supporting publication

Analytical Chemistry, (2023)

nanoparticle-characterization.png

Top:Schematic showing chemical information accessible from nanoparticle core, coating, interfaces
Bottom:NP-SIMS spectra comparing Au nanoparticle core, ligand, and substrate signals across three thiol coating lengths

Region-Specific Molecular Characterization of Nano assemblies

The functionality of complex nano assemblies is governed by distinct chemical environments at particle surfaces and interfaces. Conventional analytical techniques average these regions together, preventing region-specific molecular characterization.

Key advantages of NP-SIMS
  • Differentiate molecular information from nanoparticle cores, coatings, interfaces, and surrounding media

  • Characterize interface-specific chemistry within

        complex nanoassemblies

  • Resolve distinct nanoscale chemical environments without ensemble averaging

  • •Reveal molecular interactions occurring at particle-particle and particle-substrate interfaces

Supporting publication

Analytical Chemistry, (2023)

nanoparticle-characterization.png

Top:Schematic showing chemical information accessible from nanoparticle core, coating, interfaces
Bottom:NP-SIMS spectra comparing Au nanoparticle core, ligand, and substrate signals across three thiol coating lengths

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