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Publications

  • Investigating Byproduct Formation in Positive Tone Resists with Nanoprojectile Secondary Ion Mass Spectrometry, M.J. Eller, J. Cruz, D.S. Verkhoturov, S.V. Verkhoturov, E.A. Schweikert, 41st Int. Conf. of Photopolymer Science and Technology, June 17-21, 2024, Tokyo, Japan.

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  • NP-SIMS as a Tool for Evaluating the Homogeneity of Extreme-Ultraviolet resist Performance, J. Cruz, D.s. Verkhoturov, S.V. Verkhoturov, E.A. Schweikert, M.J. Eller, Am. Soc. Mass Spectrom., National Conference, June 2-6, 2024, Anaheim, CA.

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  • Nanoscale Molecular analysis with Nano-Projectile SIMS, M.J. Eller, D.S. Verkhoturov, S.V. Verkhoturov, E.A. Schweikert, 101st IUVSTA Workshop, May 19-24, 2024, Sao Paulo, Brazil.

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  • Nanoscale Molecular Analysis with Nano-Projectile SIMS, M.J. Eller, B. Holybee, D.S. Verkhoturov, M. Shaw, S.V. Verkhoturov, B. Bluestein, M. Hazelbaker, C. Rogan, S. Della-Negra, J.M. Blackwell, E.A. Schweikert, SPIE Proc. Vol. 12955, doi: org/10.1117/12.3011750, 2024.

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  • Nanoprojectile Secondary Ion Mass Spectrometry Enables Multiplied Analysis of Individual Hepatic Extracellular Vesicles, S. Lee, D.S. Verkhoturov, M.J Eller, S.V. Verkhoturov, M.A. Shaw, K. Gwon, Y. Kim, F. Lucien, H. Malhi, A. Revzin, E.A Schweikert, ACS Nano, 17(23), 23584-23594 (2023).

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  • Nanometrology for Evaluating Rare Sites for Molecular Homogeneity, M.J. Eller, J. Cruz, S.V. Verkhoturov, M.A. Robinson, J. Blackwell, E.A. Schweikert, Journal of Micro/Nanopatterning, Materials, and Metrology, 21(4), 044002 (2022). DOI: 10.1117/1.JMM.21.4.044002

 

  • Evaluating Nanoscale Molecular Homogeneity in Extreme Ultraviolet Resists with Nanoprojectile Secondary Ion Mass Spectrometry, J. Cruz, S.V. Verkhoturov, D.S. Verkhoturov, M.A. Robinson, J.M. Blackwell, M.J. Eller, E.A. Schweikert, Journal of Micro/Nanopatterning, Materials, and Metrology, 21(4), 044001 (2022). DOI: 10.1117/1.JMM.21.4.044001

 

  • Topological Design of Highly Anisotropic Aligned Hole Transporting Molecular Bottlebrushes for Solution- Processed OLEDs, N. Kang, S. Cho, E.E. Leonhardt, C. Liu, S.V. Verkhoturov, W.H.H Woodward, M.J. Eller, T. Yuan, T.C. Fitzgibbons, Y.P. Borguet, A.A. Jahnke, A.N. Sokolov, T. McIntire, C. Reinhardt, L. Fang, E. A. Schweikert, L.P. Spencer, G. Sun, G. Xie, P. Trefonas, K. L. Wooley, Journal of the American Chemical Society, 144(18), 8084-8095 (2022). DOI: 10.1021/jacs.2c00420

 

  • Nanoprojectile SIMS for Nanometrology of Nanoparticles and their Interfaces, M.J. Eller, J.M. Sandoval, S.V. Verkhoturov, E. A. Schweikert, Chem, 94(22), 7868-7876 (2022). DOI: 10.1021/acs.analchem.2c00303

 

  • New Methodology for Accurate Determination of Molecular Co-localization at the Nanoscale, D.S. Verkhoturov, M.J. Eller, Y.D. Han, B. Crulhas, S.V. Verkhoturov, A. Revzin, E.A. Schweikert, Langmuir: the ACS journal of surfaces and colloids, 38(18), 5626-5632 (2022). DOI: 10.1021/acs.langmuir.2c00217

 

  • Nanoprojectile Secondary Ion Mass Spectrometry for Analysis of Extracellular Vesicles, D.S. Verkhoturov, B.P. Crulhas, M.J. Eller, Y.D. Han, S.V. Verkhoturov, Y. Bisrat, A. Revzin, E.A. Schweikert, Chem., 93(20), 7481-7490 (2021). DOI: 10.1021/acs.analchem.1c00689

 

  • Nanoscale molecular analysis of positive tone photo-resist films with varying dose, M.J. Eller, M. Li, X. Hou, S.V. Verkhoturov, E.A. Schweikert, P. Trefonas, SPIE, 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV, (Advanced Lithography, San Jose, CA), 113252R, (2020). DOI: 10.11171/12.2551941

 

  • Understanding photoacid generator distribution at the nanoscale using massive cluster secondary ion mass spectrometry, M.J. Eller, M. Li, X. Hou, S.V. Verkhoturov, E.A. Schweikert, P. Trefonas, Micro/Nanolith., MEMS, MOEMS, 18, (2019).  DOI: 10.1117/1.JMM.18.2.023504

 

  • Nano-scale Molecular Analysis of Photo-resist Films with Massive Cluster Secondary Ion Mass Spectrometry, M.J. Eller, M. Li, X. Hou, S.V. Verkhoturov, E.A. Schweikert, P. Trefonas, Micro/Nanolith., MEMS, MOEMS, 18, 023504 (2019). DOI:  10.1117/12.2515367

 

  • Hypervelocity Cluster Ion Impacts on Free-standing Graphene: Experiment, Theory and Applications, S.V. Verkhoturov, M. GoÅ‚uÅ„ski, D.S. Verkhoturov, B. Czerwinski, M.J. Eller, S. Geng, Z. Postawa, E.A. Schweikert, Chem. Phys., 150, 160901 (2019).  DOI:  10.1063/1.5080606

 

  • Label Free Particle-by-Particle Quantification of DNA-Loading on Sorted Gold Nanostars M.J. Eller, K. Chandra, E.E. Coughlin, T.W. Odom, E.A. Schweikert, Chem., 91, 5566-5572 (2019). DOI: 10.1021/acs.analchem.8b03715

 

  • Fluoropolymer-diluted Small Molecule Organic Semiconductors with Extreme Thermal Stability, J.S. Price, B. Wang, T. Kim, A.J. Grede, J.M. Sandoval, R. Xie, Y. Shen, D.R. Adams, M. J. Eller, A. Sokolov, S. Mukhopadhyay, P. Trefonas, E.D. Gomez, E. A. Schweikert, N.C. Giebink, Phys. Lett. 113, 263303 (2018). DOI:  10.1063/1.5053923

 

  • Molecular Co-localization Using Massive Gold Cluster Secondary Ion Mass Spectrometry, M.J. Eller, A. Vinjaumuri, B.E. Tomlin, E.A. Schweikert, Chem., 90, 12693-12697 (2018). DOI: 10.1021/acs.analchem.8b02950

 

  • Testing Molecular Homogeneity at the Nanoscale with Massive Cluster Secondary Ion Mass Spectrometry, M.J. Eller, S.V. Verkhoturov, E.A. Schweikert, Chem., 88, 7639-7646 (2016). DOI: 10.1021/acs.analchem.6b01466

 

  • Characterization of nanometric inclusions via nanoprojectile impacts, A.B. Clubb, M.J. Eller, S.V. Verkhoturov, E.A. Schweikert, R.M. Anderson, R.M. Crooks, Vac. Sci. Technol. B, 34(3), 03H104-1-03H104-4 (2016). DOI: 10.1116/1.4940152

 

  • Nanodomain Analysis with Cluster-SIMS: Application to the Characterization of Macromolecular Brush Architecture, F. Yang, S. Cho, G. Sun, S.V. Verkhoturov, J.W. Thackeray, P. Trefonas, K.L. Wooley, E.A. Schweikert, Surface and Interface Analysis,47, 1051-1055 (2015). DOI: 1002/sia.5812

 

  • Mass Spectrometry of Nanoparticles is Different: The Metrology Challenge, C.-K. Liang, M.J. Eller, S.V. Verkhoturov, E.A. Schweikert, JASMS, 26, 8, 1259-1265 (2015). DOI:  1007/s13361-015-1151-9

 

  • Advanced Photoresist Technologies by Intricate Molecular Brush Architectures: Diblock Brush Terpolymer-Based Positive-Tone Photoresist Materials, G. Son, S. Cho, F. Yang, X. He, A. Pavia, C. Clark, J.E. Raymond, S.V. Verkhoturov, E.A. Schweikert, J Thackeray, P. Trefonas, K.L. Wooley, Polym. Sci., Part A: Polym. Chem., 53, 193-199 (2015).  DOI:  10.1002/pola.27362

 

  • SIMS Methodology for Probing the Fate and Dispersion of Catalytically Active Molecules, C.-K. Liang, S.-T. Chang, S. V. Verkhoturov, L.-C. Chen, K.-H. Chen, E.A. Schweikert, J. Mass Spectrom., 370, 107-113(2014). DOI:  10.1016/j.ijms.2014.07.003

 

  • Directing Self-Assembly of Nanoscopic Cylindrical Diblock Brush Terpolymers into Films with Desired Spatial Orientations: Expansion of Chemical Composition Scope, S. Cho, F. Yang, G. Sun, M.J. Eller, C. Clark, E.A. Schweikert, J.W. Thackery, P. Trefonas, K.L. Wooley, Rapid Commun., 35(4), 437-441(2014). DOI:  10.1002/marc.201300845

 

  • Bottom-up/Top-down, High Resolution, High-Throughput Lithography Using Vertically Assembled Block Bottle Brush Polymers, P. Trefonas, J.W. Thackeray, G. Sun, S. Cho, C. Clark, S.V. Verkhoturov, M.J. Eller, A. Li, A. Pavia-Sanders, E.A. Schweikert, K.L. Wooley, Micro/Nanolith MEMS MOEMS, 12(4), 043006-1 – 043006-10 (2013). DOI: 10.1117/1.jmm.12.4.043006

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